Dual Beam (FIB/SEM)

FEI Helios Nanolab 660 Features

Imaging

  • Field Emission Gun (Schottky emitter), with UC technology (monochromator)
  • Sub-nanometer resolution from 500 V to 30 kV
  • Beam deceleration capabilities (stage bias)
  • Specimen Stage: x, y 150 mm; z 10mm all piezo driven; tilt -10 to +60°
  • Six electron detectors for optimal imaging

Focused Ion Beam (FIB)

  • Gallium LMIS (Liquid Metal Ion Source) for precision milling, cross-sectioning, TEM sample preparation
  • Gas Injection System (GIS) for metal and insulator deposition
  • Slice milling and imaging steps automated for 3D SEM reconstruction

Characterization

  • Oxford EDX detector for elemental analysis
  • Oxford EBSD detector for crystal orientation analysis
  • 3D EDX and EBSD capabilties

Ideal for: Ultra high resolution imaging, in-situ cross-sectioning and TEM sample preparation, tomography