FEI Helios Nanolab 660 Features
Imaging
- Field Emission Gun (Schottky emitter), with UC technology (monochromator)
- Sub-nanometer resolution from 500 V to 30 kV
- Beam deceleration capabilities (stage bias)
- Specimen Stage: x, y 150 mm; z 10mm all piezo driven; tilt -10 to +60°
- Six electron detectors for optimal imaging
Focused Ion Beam (FIB)
- Gallium LMIS (Liquid Metal Ion Source) for precision milling, cross-sectioning, TEM sample preparation
- Gas Injection System (GIS) for metal and insulator deposition
- Slice milling and imaging steps automated for 3D SEM reconstruction
Characterization
- Oxford EDX detector for elemental analysis
- Oxford EBSD detector for crystal orientation analysis
- 3D EDX and EBSD capabilities
Ideal for: Ultra high resolution imaging, in-situ cross-sectioning and TEM sample preparation, tomography